University of Missouri-System Office
Higher EducationMO
Posted
Oct 7, 2026
Oct 21, 2026
Description: Request for bids for the purchase of a plasma enhanced chemical vapor deposition (PECVD) and an inductive coupled plasma - reactive ion etching (ICP-RIE) system.
HigherEducation · WI, US
Solicitation files and supporting documents for this bid.
Decision makers connected to this RFP from University Of Wisconsin Madison.
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University of Missouri-System Office
Higher EducationMO
Posted
Oct 7, 2026
Oct 21, 2026
Provide plasma enhanced chemical vapor deposition (PECVD) system.
CountyFL
Posted
-
Nov 10, 2026
Seeking a fully automated inductively coupled argon plasma atomic emission spectrometer (hereinafter “ICP”) system capable of precisely and accurately determining the concentrations of elements in a variety of sample matrices, including but not limited to industrial wastewaters, surface waters, groundwater and drinking water.
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Higher EducationNC
Posted
Oct 8, 2026
Oct 22, 2026
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FederalDC
Posted
Oct 9, 2026
Oct 23, 2026
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