JC 12-25-1102 - Plasma Assisted Reactive Magnetron Sputter System

Description: McMaster University posted an Advance Contract Award Notice (Formal) for the purchase of a Plasma Assisted Reactive Magnetron Sputter System (PARMS), reference JC 12-25-1102. The system must deposit dense, hydrogen-free silicon nitride, aluminium oxide, and silicon dioxide films with precise control over film stress and thickness for low-loss photonic devices. The notice also requires uniform and repeatable nitride and oxide films at practical deposition rates for thick-film growth, identifies IntlVac as the pre-selected supplier, and is a procurement notice rather than a grant program.