Primary S-Parameter Standards for Plasma Etching Record

Description: The National Institute of Standards and Technology (NIST) requests firm fixed-price quotations to design and fabricate seven metrology-grade male DIN 7/16 offset shorts to IEEE 287.1-2021 specifications. These primary S-parameter standards are required to establish traceability for high-power RF waveform measurements used in semiconductor plasma processing research. The solicitation is a full and open competition under NAICS 334516 and requires delivery of mechanical drawings and gold-plated, beadless surfaces to NIST Boulder.