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Atomic Layer Deposition (ALD) Reactor System

Description: The Naval Research Laboratory is seeking an atomic layer deposition (ALD) reactor system for uniform and conformal deposition of oxide, nitride, and metal films on substrates with high-aspect-ratio topographies. The system must support substrates or wafers of at least 150 mm, accommodate at least eight precursor sources expandable to twelve, and include at least four process-gas lines. This is an active commercial-item combined synopsis/solicitation and request for quotations set aside for small businesses, not a grant program.

Buyer
Released
Sep 1, 2026
Closes
Sep 14, 2026(11 days left)

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