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RFPs/Low Temperature Plasma Enhance Chemical Vapor Deposition System for SiO2 and Si3N4 (RFP)

Low Temperature Plasma Enhance Chemical Vapor Deposition System for SiO2 and Si3N4 (RFP)

University Of Arizona

Summary

Provide a system capable of depositing low temperature silicon nitride and silicon oxide.

Files

L192517_Low_Temp_Plasma_Deposition_System

pdf

Details

Release

Feb 14, 2025

Close

Mar 07, 2025

Contacts

Source

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